Intel begins expansion of its Bowers Campus in Santa Clara to produce more photomasks in-house.

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...

Jul. 1—SANTA CLARA — Intel has broken ground on what it describes as an expansion of its mask operations center in Santa Clara, an essential first step in the chip manufacturing process. The new ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...

A surge in demand for chips at mature nodes, coupled with aging photomask-making equipment at those geometries, are causing significant concern across the supply chain. These issues began to surface ...

HSINCHU, Taiwan — Foundry chipmaker United Microelectronics Corp. said Thursday (December 4, 2003) that it has begun using chrome-less phase-shift masks within its 90-nm manufacturing process. UMC is ...